Primarily used for 3-6 inch epitaxial growth of III-V compound semiconductor crystals under high vacuum conditions, featuring oxygen-free tube sealing process and automated control system.

II. Key Parameters:

III. Main Features and Advantages

1. Capable of querying historical temperature records, including historical data and temperature curves.

2. Curve viewing function: Supports temperature, gas, power, and vacuum level monitoring.

3. Manual/automatic control: Enables temperature, gas, power settings, and valve switching control.

4. Alarm monitoring: Allows querying of alarm types.

5. Power limit protection: Different maximum power settings for different temperatures.

6. Hierarchical management: Parameters can be modified based on login credentials.

7. Data export: Temperature and flow data can be exported to USB drives.

The hardware system offers flexible expandability, facilitating additional functions like boat drive control and gas flow monitoring for various furnace configurations.